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Unveiling High NA EUV | ASML

Unveiling High NA EUV | ASML on HackerTube: recommended by 1 Hacker News commenter across 1 month, 2024–2025.

ASML

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ASML's short promotional fly-through of its High NA EUV lithography platform, the TWINSCAN EXE, which supports 8-nanometer resolution. It shows the machine's internals including advanced anamorphic optics.

Why Hacker News recommends it

HN links it to show the sheer complexity of EUV machines, especially when discussing whether competitors can challenge ASML.

people recommended it
1
separate months
1
strong recommendations
1
discussed on HN
2024–2025
“I recommend highly to everyone who thinks a startup can challenge ASML this 1.38min video”
— ta12653421, Nov 2025, in “US startup Substrate announces chipmaking tool that it says will rival ASML”

What HN commenters said

4 Hacker News comments link this video. Each one links back to its thread.

ta12653421Nov 2025Strongly recommends

LOL, I recommend highly to everyone who thinks a startup can challenge ASML this 1.38min video: ▶ this video Its an industrial flight video through a ASML TWIN Exe HighNAV. Here is also a presentation of ~45min at CCC / Germany (in English language) which I highly recommend to watch: [link] Especially the explanation how they use two milisecond laser shots to first molt the tin and then distribute it symetrically(!!!) with a second shot across the surface. There IS NO chance that this startup will be able to somehow compete, if even Chinese state actors cant do it (yet).

in “US startup Substrate announces chipmaking tool that it says will rival ASML” · View on HN

danparsonsonJan 2025Cites it

The rest of the machine is no less incredible - the EUV light is reflected off a series of mirrors (the largest weighing, IIRC, somewhere in the region of 300kg, and the largest that Zeiss have ever made) onto a mask of the target pattern, which is rapidly shuttling back and forth, onto another series of mirrors, and finally focused onto the wafer stage, which is also moving precisely in step with the mask, to expose the photoresist on a single die which is on the order of 10mm square. And each wafer goes through multiple cycles of this, so not only does the machine rapidly create features at the nanonmetre scale with incredible accuracy, but again and again in exactly the same place after removing and returning the wafer. Oh, and the wafer stage is pretty fun too; it uses an electrostatic chuck that induces a charge in the wafer and therefore holds it firmly in place without needing any kind of suction that could distort the wafer. Promotional fly through video from ASML here: ▶ this video Asianometry video about the stage: [link] Another short video about the light source: [link]

in “Dutch Align with US Export Controls on Some ASML Chip Tools” · View on HN

danparsonsonNov 2024Cites it

Fly-through promotional render of the real thing: ▶ this video Incredible technology - the light-source works by generating droplets of molten tin, firing them through a chamber at around (IIRC) 200mph, and hitting each droplet with two laser pulses... at 50kHz. How they achieve that using Lego is beyond me.

in “ASML Twinscan EXE:5000 Lego Set” · View on HN

chasilSep 2024Cites it

I just found this one. ▶ this video Edit: I didn't realize that the droplets are hit twice by different lasers. [link]

in “China's chip capabilities just 3 years behind TSMC, teardown shows” · View on HN

Topics & tags

Semiconductors & chip manufacturingasmlhigh na euvchip manufacturinglithographysemiconductors